InTechOpen, 2013. — 259 p. — ISBN: 9535111757, 9789535111757.
На англ. языке.Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-photonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.Contents
Lithography for 3D Structure and Nano Scale.
Colloidal Lithography.
Recent Advances in Two-Photon Stereolithography.
Femtosecond Laser Lithography in Organic and Non-Organic Materials.
Three-Dimensional Lithography Using Combination of Nanoscale Processing and Wet Chemical Etching.
Combination of Lithography and Coating Methods for Surface Wetting Control.
Resist.
Resist Homogeneity.
Nanoimprint.
Soft UV Nanoimprint Lithography and Its Applications.
Sub-30 nm Plasmonic Nanostructures by Soft UV Nanoimprint Lithography.
Fabrication of 3D Nano-Structure.
The Fabrication of High Aspect Ratio Nanostructures on Quartz Substrate.
Fabrication of 3D Micro- and Nano-Structures by Prism-Assisted UV and Holographic Lithography.
