Elsevier, 1990. — 718 p. — ISBN: 978-0-444-98801-0, 0-444-98801-7, 0-444-41903-9.The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously.Table of contents :
Evolution of CVD Films
Techniques of Preparing Thin Films
Chemical Processes Used in CVD
Thermodynamics of CVD
Kinetics of CVD
Measurement of Thin Film Thickness
Nucleation and Growth of CVD Films
Thin Film Structure
Analysis of CVD Films
Properties of CVD Films
Equipment and Substrates
Preparation and Properties of Semiconducting Thin Films
Preparation and Properties of Amorphous Insulating Thin Films
Preparation and Properties of Conductive Thin Films
Preparation and Properties of Superconducting and Magnetic Thin Films
Uses of CVD Thin Films
Present and Future Importance of CVD Films
References
Index of Acronyms and Abbreviations
Author Index
CVD Film Index
Subject Index
Supplier Index
