Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.
Author(s): Hiroyuki Fujiwara
Edition: 1
Publisher: Wiley
Year: 2007
Language: English
Pages: 388
Cover......Page 1
Spectroscopic Ellipsometry......Page 4
ISBN-13: 9780470016084......Page 5
Contents......Page 8
Foreword......Page 14
Preface......Page 16
Acknowledgments......Page 18
1 Introduction to Spectroscopic
Ellipsometry......Page 20
2 Principles of Optics......Page 32
3 Polarization of Light......Page 68
4 Principles of Spectroscopic
Ellipsometry......Page 100
5 Data Analysis......Page 166
6 Ellipsometry of Anisotropic Materials......Page 228
7 Data Analysis Examples......Page 268
8 Real-Time Monitoring by
Spectroscopic Ellipsometry......Page 330
Appendices......Page 12
Appendix 1 Trigonometric Functions......Page 364
Appendix 2 Definitions of Optical
Constants......Page 366
Appendix 3 Maxwell’s Equations for
Conductors......Page 368
Appendix 4 Jones–Mueller Matrix
Conversion......Page 372
Appendix 5 Kramers–Kronig Relations......Page 376
Index......Page 380
