This handbook is a broad review of semiconductor materials and process technology, with emphasis on very large-scale integration (VLSI) and ultra large scale integration (ULSI). The technology of integrated circuit (IC) processing is expanding so rapidly that it can be difficult for the scientist working in one area to keep abreast of developments in other areas of the field. This handbook solves this problem by bringing together "snapshots" of the various aspects of the technology.
Author(s): Gary F. McGuire
Year: 1989
Language: English
Pages: 688
Semiconductor MaterialsandProcess Technology......Page 4
Copyright......Page 5
Contributors......Page 6
Contents......Page 8
Introduction......Page 16
1 Silicon Materials Technology......Page 23
2 The Thermal Oxidation of Siliconand Other Semiconductor Materials......Page 61
3 Chemical Vapor Deposition of Siliconand Its Compounds......Page 95
4 Chemical Etching and SliceCleanup of Silicon......Page 141
5 Plasma Processing:Mechanisms and Applications......Page 206
6 Physical Vapor Deposition......Page 344
7 Diffusion and Ion Implantation in Silicon......Page 470
8 Microlithography for VLSI......Page 556
9 Metallization for VLSI Interconnectand Packaging......Page 590
10 Characterization of Semiconductor Materials......Page 625
Index......Page 684
