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Resolution Enhancement Techniques in Optical Lithography

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This tutorial summarizes optical lithography enhancement research and development over the past 20 years. Discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.

Contents

- Foreword
- Preface
- List of symbols
- Introduction
- Optical imaging and resolution
- Modified illumination
- Optical proximity correction
- Alternating phase-shifting mask
- Attenuated phase-shift mask
- Selecting appropriate RETs
- Second-generation RETs
- Concluding remarks
- k1 conversion charts
- Bibliography
- Index

Author(s): Alfred Kwok-Kit Wong
Series: SPIE Tutorial Texts in Optical Engineering Vol. TT47
Edition: 0
Publisher: SPIE Publications
Year: 2001

Language: English
Pages: 234
Tags: Приборостроение;Полупроводниковые приборы;