Polymers in Microlithography. Materials and Processes

Content: Polymers in microlithography : an overview / Elsa Reichmanis and Larry F. Thompson --
Brönsted acid generation from triphenylsulfonium salts in acid-catalyzed photoresist films / D.R. McKean, U. Schaedeli, and Scott A. MacDonald --
Chemically amplified resists : effect of polymer and acid generator structure / Francis M. Houlihan, Elsa Reichmanis, Larry F. Thompson, and Regine G. Tarascon --
Copolymer approach to design of sensitive deep-UV resist systems with high thermal stability and dry etch resistance / Hiroshi Ito, Mitsuru Ueda, and Mayumi Ebina --
Nonswelling negative resists incorporating chemical amplification : the electrophilic aromatic substitution approach / Jean M.J. Fréchet, Stephen Matuszczak, Harald D.H. Stöver, C. Grant Willson, and Berndt Reck --
Acid-catalyzed cross-linking in phenolic-resin-based negative resists / A.K. Berry, K.A. Graziano, L.E. Bogan, Jr., and J.W. Thackeray --
New design for self-developing imaging systems based on thermally labile polyformals / Jean M.J. Fréchet, C. Grant Willson, T. Iizawa, T. Nishikubo, K. Igarashi, and J. Fahey --
Polysilanes : solution photochemistry and deep-UV lithography / R.D. Miller, G. Wallraff, N. Clecak, R. Sooriyakumaran, J. Michl, T. Karatsu, A.J. McKinley, K.A. Klingensmith, and J. Downing --
Syntheses of base-soluble Si polymers and their application to resists / Shuzi Hayase, Rumiko Horiguchi, Yasunobu Onishi, and Toru Ushirogouchi --
Lithographic evaluation of phenolic resin-dimethyl siloxane block copolymers / M.J. Jurek and Elsa Reichmanis --
Preparation of a novel silicone-based positive photoresist and its application to an image reversal process / Akinobu Tanaka, Hiroshi Ban, and Saburo Imamura --
Photooxidation of polymers : application to dry-developed single-layer deep-UV resists / Omkaram Nalamasu, Frank A. Baiocchi, and Gary N. Taylor --
Kinetics of polymer etching in an oxygen glow discharge / Charles W. Jurgensen --
Quantitative analysis of a laser interferometer waveform obtained during oxygen reactive-ion etching of thin polymer films / B.C. Dems, P.D. Krasicky, and F. Rodriguez --
Evaluation of several organic materials as planarizing layers for lithographic and etchback processing / L.E. Stillwagon and Gary N. Taylor --
New negative deep-UV Resist for KrF excimer laser lithography / Masayuki Endo, Yoshiyuki Tani, Masaru Sasago, and Noboru Nomura --
Characterization of a thiosulfate functionalized polymer : a water-soluble photosensitive zwitterion / C.E. Hoyle, D.E. Hutchens, and S.F. Thames --
Pyrimidine derivatives as lithographic materials / Yoshiaki Inaki, Minoo Jalili Moghaddam, and Kiichi Takemoto --
Synthesis of new metal-free diazonium salts and their applications to microlithography / Shou-ichi Uchino, Michiaki Hashimoto, and Takao Iwayanagi --
Photobleaching chemistry of polymers containing anthracenes / James R. Sheats --
Lithography and spectroscopy of ultrathin Langmuir-Blodgett polymer films / S.W.J. Kuan, P.S. Martin, L.L. Kosbar, C.W. Frank, and R.F.W. Pease --
Dissolution of phenolic resins and their blends / J.P. Huang, E.M. Pearce, A. Reiser, and T.K. Kwei --
Solvent concentration profile of poly(methyl methacrylate) dissolving in methyl ethyl ketone : a fluorescence-quenching study / William Limm, Mitchell A. Winnik, Barton A. Smith, and Deirdre T. Stanton --
Molecular studies on laser ablation processes of polymeric materials by time-resolved luminescence spectroscopy / Hiroshi Masuhara, Akira Itaya, and Hiroshi Fukumura --
Mechanism of polymer photoablation explored with a quartz crystal microbalance / Sylvain Lazare and Vincent Granier --
Mechanism of UV- and VUV-induced etching of poly(methyl methacrylate) : evidence for an energy-dependent reaction / Nobuo Ueno, Tsuneo Mitsuhata, Kazuyuki Sugita, and Kenichiro Tanaka.