Content: Applications of photoinitiated cationic polymerization to the development of new photoresists / J.V. Crivello -- Applications of photoinitiators to the design of resists for semiconductor manufacturing / Hiroshi Ito and C. Grant Willson -- Semiempirical calculations of electronic spectra : use in the design of mid-UV sensitizers / R.D. Miller, D.R. Mckean, T.L. Tompkins, N. Clecak, C. Grant Willson, J. Michl, and J. Downing -- Mid-UV photosensitization of diazoquinone positive photoresists / W.T. Babie, M-F. Chow, and W.M. Moreau -- Deep UV photolithography with composite photoresists made of poly(olefin sulfones) / H. Hiraoka and L.W. Welsh, Jr. -- Method for a comparative study of positive photoresist lithographic performance / C.C. Walker and J.N. Helbert -- Dependence of dissolution rate on processing and molecular parameters of resists / A.C. Ouano -- Effect of composition on resist dry-etching susceptibility : novel vinyl polymers / J.N. Helbert, M.A. Schmidt, C. Malkiewicz, E. Wallace, Jr., and C.U. Pittman, Jr. -- Resists for electron beam lithography / Toshiaki Tamamura, Saburo Imamura, and Shungo Sugawara -- Chain-scission yields of methacrylate copolymers under electron beam radiation / C.C. Anderson, P.D. Krasicky, F. Rodriguez, Y. Namaste, and S.K. Obendorf -- Poly(tetrafluorochloropropyl methacrylate) as positive electron resist / B. Bednář, J. Devátý, J. Králíček, and J. Zachoval -- Radiation-induced degradation of poly(2-methyl-1-pentene sulfone) : kinetics and mechanism / M.J. Bowden, D.L. Allara, W.I. Vroom, J. Frackoviak, L.C. Kelley, and D.R. Falcone -- The radiation degradation of poly(2-methyl-1-pentene sulfone) : radiolysis products / T.N. Bowmer and M.J. Bowden -- Novolac based positive electron beam resist containing a polymeric dissolution inhibitor : preparation and exposure characteristics / Hiroshi Shiraishi, Asao Isobe, Fumio Murai, and Saburo Nonogaki -- Molecular design for cross-linking negative resists : relationship between sensitivity and component ratio in copolymer resists / Katsumi Tanigaki, Yoshitake Ohnishi, and Shozo Fujiwara -- Molecular design for cross-linking negative resists : optimum design for poly(chloromethylstyrene-co-2-vinylnaphthalene) / Yoshitake Ohnishi, Katsumi Tanigaki, and Akihiro Furuta -- Poly(butadiene-co-glycidyl methacrylate) as negative electron resist / B. Bednář, J. Devátý, J. Králíček, and J. Zachoval -- Plasma developable electron resists / Juey H. Lai -- Solution characterization of polyamic acids and polyimides / P. Metzger Cotts and W. Volksen -- Ultrapure polyimides : syntheses and applications / J. Duran and N.S. Viswanathan -- Photosensitive polyimide siloxane / Gary C. Davis -- Catalysts for epoxy molding compounds in microelectronic encapsulation / Winston C. Mih -- Thermogravimetric analysis of silicone elastomers as integrated circuit device encapsulants / Ching-Ping Wong -- Removable polyurethane encapsulants / K.B. Wischmann -- Improvements to microcircuit reliability by the use of inhibited encapsulants / F.W. Ainger, J. Brettle, I. Dix, and M.T. Goosey -- Photopolymer dielectrics : the characterization of curing behavior for modified acrylate systems / R.D. Small, J.A. Ors, and B.S.H. Royce -- Morphology of rubber-modified photopolymers / J.A. Ors and J.B. Enns -- UV solder masks as insulators for printed circuit boards / Neil S. Fox -- UV-curable conformal coatings / C.R. Morgan, D.R. Kyle, and R.W. Bush -- Thermal expansion coefficients of leadless chip carrier compatible printed wiring boards / Z.N. Sanjana, R.S. Raghava, and J.R. Marchetti -- Piezoelectric poly(vinylidene fluoride) in small-bore, thick-walled tubular form : continuous production and properties / P. Pantelis -- Polymeric reactions in magnetic recording media / Lesley J. Goldstein -- Fabrication of conductive polyimide-gate transistors / David R. Day -- Redox properties of conjugated polymers : a successful correlation of theory and experiment / R.R. Chance, D.S. Boudreaux, J.L. Bredas, and R. Silbey -- A novel phase of organic conductors : conducting polymer solutions / J.E. Frommer, R.L. Elsenbaumer, and R.R. Chance -- Poly-p-phenylene selenide and poly-p-phenylene telluride : characterization and assessment as active elements / L.A. Acampora, D.L. Dugger, T. Emma, J. Mohammed, M.F. Rubner, L. Samuelson, D.J. Sandman, and S.K. Tripathy -- Electrochemical synthesis and characterization of poly(2,2'-bithiophene) / M.A. Druy, R.J. Seymour, and S.K. Tripathy -- The influence of microstructure on the properties of polyacetylene/polybutadiene blends / S.K. Tripathy and M.F. Rubner -- Ethylene-propylene-diene terpolymer/polyacetylene and styrene-diene triblock copolymer/polyacetylene blends : characterization and stability studies / Kang I. Lee and Harriet Jopson -- Conductive hybrids based on polyacetylene: copolymers and blends / M.E. Galvin, G.F. Dandreaux, and G.E. Wnek -- Electrically conductive polymer composites of 7,7,8,8-tetracyanoquinodimethane (TCNQ) salt dispersion : influence of charge-transfer interaction and film morphology / Oh-Kil Kim -- Synthesis and properties of conducting films by plasma polymerization of tetramethyltin / R.K. Sadhir and W.J. James -- Plasma polymerized organometallic thin films : preparation and properties / R.K. Sadhir, H.E. Saunders, and W.J. James -- Polyacetylene, (CH)x : an electrode-active material in aqueous and nonaqueous electrolytes / R.B. Kaner, A.G. Macdiarmid, and R.J. Mammone
Author(s): Theodore Davidson (Eds.)
Series: ACS Symposium Series 242
Publisher: American Chemical Society
Year: 1984
Language: English
Pages: 576
City: Washington, D.C
Title Page......Page 1
Copyright......Page 2
ACS Symposium Series......Page 3
FOREWORD......Page 4
PdftkEmptyString......Page 0
PREFACE......Page 5
Results and Discussion......Page 6
Photoimaging Processes Based on Onium Salts......Page 8
Conclusions......Page 12
Literature Cited......Page 13
2 Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing......Page 14
Results and Discussion......Page 15
Experimental......Page 23
Literature Cited......Page 25
3 Semiempirical Calculations of Electronic Spectra Use in the Design of Mid-UV Sensitizers......Page 27
Results......Page 29
References......Page 42
4 Mid-UV Photosensitization of Diazoquinone Positive Photoresists......Page 43
Experimental......Page 44
Results and Discussions......Page 45
Literature Cited......Page 55
5 Deep UV Photolithography with Composite Photoresists Made of Poly(olefin sulfones)......Page 56
Dry Developable Composite Photoresists with Poly(Olefin Sulfones)......Page 57
Composite Photoresists Made of Poly(Olefin Sulfones) and Novolac Resins......Page 58
Literature Cited......Page 65
6 Method for a Comparative Study of Positive Photoresist Lithographic Performance......Page 66
Nanoline Measurement Method......Page 67
Results and Discussion......Page 68
Acknowledgments......Page 74
Literature Cited......Page 78
7 Dependence of Dissolution Rate on Processing and Molecular Parameters of Resists......Page 79
Processing Effects......Page 80
Radiation Exposure Effects......Page 82
Stereo Chemistry Effects......Page 84
Concluding Remarks......Page 87
Literature Cited......Page 90
8 Effect of Composition on Resist Dry-Etching Susceptibility Novel Vinyl Polymers......Page 91
Results and Discussion......Page 93
Literature Cited......Page 100
9 Resists for Electron Beam Lithography......Page 101
Positive electron resists......Page 103
Negative electron resists......Page 107
Literature Cited......Page 114
10 Chain-Scission Yields of Methacrylate Copolymers Under Electron Beam Radiation......Page 117
Polymer Preparation (Table II)......Page 118
Evaluation......Page 120
Results and Discussion......Page 121
Literature Cited......Page 125
11 Poly(tetrafluorochloropropyl methacrylate) as Positive Electron Resist......Page 126
Results and Discussion......Page 127
Literature cited......Page 131
12 Radiation-Induced Degradation of Poly(2-methyl-1-pentene sulfone) Kinetics and Mechanism......Page 132
Experimental......Page 135
Temperature Considerations......Page 136
Dose Dependence of Pure Film......Page 139
Effect of Novolac Resin on Depolymerization Kinetics......Page 142
Literature Cited......Page 149
13 The Radiation Degradation of Poly(2-methyl-1-pentene sulfone) Radiolysis Products......Page 150
EXPERIMENTAL......Page 151
RESULTS......Page 152
DISCUSSION......Page 155
REFERENCES......Page 162
14 Novolac Based Positive Electron Beam Resist Containing a Polymeric Dissolution Inhibitor Preparation and Exposure Characteristics......Page 164
Experimental......Page 165
Results and Discussion......Page 166
Literature Cited......Page 172
15 Molecular Design for Cross-linking Negative Resists Relationship Between Sensitivity and Component Ratio in Copolymer Resists......Page 174
Theoretical basis......Page 175
Application to a copolymer resist of monomer M and monomer Ν......Page 176
Results and discussion......Page 179
Symbols......Page 184
Literature Cited......Page 186
16 Molecular Design for Cross-linking Negative Resists Optimum Design for Poly(chloromethylstyrene-co-2-vinylnaphthalene)......Page 187
Design Method......Page 188
Experimental Results and Discussion......Page 194
Literature Cited......Page 196
17 Poly(butadiene-co-glycidyl methacrylate) as Negative Electron Resist......Page 197
Thermal Analysis......Page 198
Lithographic Properties......Page 200
Literature Cited......Page 207
18 Plasma Developable Electron Resists......Page 208
Experimental......Page 209
Monomer/Polymer Compatibility......Page 210
Sublimation Barrier......Page 212
DPAE/PTCEM Resist......Page 213
Literature Cited......Page 218
19 Solution Characterization of Polyamic Acids and Polyimides......Page 219
Experimental......Page 221
Results and Discussion......Page 222
Literature Cited......Page 228
20 Ultrapure Polyimides: Syntheses and Applications......Page 230
MATERIALS PURIFICATIONS......Page 232
POLYAMIC ACID SYNTHESIS......Page 235
CHARACTERIZATION......Page 237
PROPERTIES OF CURED FILMS......Page 239
CURE OPTIMIZATION......Page 243
RESIST PROCESS OPTIMIZATION......Page 244
CONCLUSIONS......Page 247
Literature Cited......Page 248
21 Photosensitive Polyimide Siloxane......Page 250
Experimental......Page 252
Results and Discussion......Page 253
Summary......Page 259
Literature Cited......Page 260
22 Catalysts for Epoxy Molding Compounds in Microelectronic Encapsulation......Page 261
Epoxy Curing Mechanism......Page 262
Catalysts......Page 269
Literature Cited......Page 270
23 Thermogravimetric Analysis of Silicone Elastomers as Integrated Circuit Device Encapsulants......Page 272
Experimental......Page 273
Results and Discussion......Page 278
Literature Cited......Page 290
24 Removable Polyurethane Encapsulants......Page 292
Experimental......Page 293
Results and Discussion......Page 294
Summary and Conclusion......Page 298
Literature Cited......Page 299
25 Improvements to Microcircuit Reliability by the Use of Inhibited Encapsulants......Page 300
Corrosion of Aluminium and its Inhibition......Page 301
Experimental Measurements......Page 303
Further Work......Page 308
Literature Cited......Page 309
26 Photopolymer Dielectrics: The Characterization of Curing Behavior for Modified Acrylate Systems......Page 310
Materials......Page 311
Mixtures......Page 312
FTIR and FTIR PAS......Page 313
Solvent Absorption......Page 316
Thermogravimetric Analysis (TGA)......Page 320
Solvent Extraction......Page 324
DISCUSSION AND CONCLUSIONS......Page 327
Literature Cited......Page 329
27 Morphology of Rubber-Modified Photopolymers......Page 330
EXPERIMENTAL......Page 331
EXTENT OF CURE......Page 333
THE GLASS TRANSITION TEMPERATURE......Page 338
MORPHOLOGY......Page 343
Acknowledgement......Page 347
LITERATURE CITED......Page 350
28 UV Solder Masks as Insulators for Printed Circuit Boards......Page 351
Chemistry......Page 352
Experimental......Page 353
Results and Discussion......Page 354
Literature Cited......Page 356
Chemistry......Page 357
Testing and Properties......Page 359
Literature Cited......Page 361
30 Thermal Expansion Coefficients of Leadless Chip Carrier Compatible Printed Wiring Boards......Page 362
Experimental......Page 363
Results and Discussion......Page 365
Conclusions......Page 377
Literature Cited......Page 379
31 Piezoelectric Poly(vinylidene fluoride) in Small-Bore, Thick-Walled Tubular Form Continuous Production and Properties......Page 380
Experimental......Page 381
Coefficient Test Methods......Page 383
Results and Discussion......Page 384
Applications......Page 386
Literature Cited......Page 388
32 Polymeric Reactions in Magnetic Recording Media......Page 389
Experimental......Page 392
Discussion......Page 395
Literature cited......Page 399
33 Fabrication of Conductive Polyimide-Gate Transistors......Page 401
Background......Page 402
Experimental......Page 404
RESULTS AND DISCUSSION......Page 405
Literature Cited......Page 409
34 Redox Properties of Conjugated Polymers A Successful Correlation of Theory and Experiment......Page 410
Theoretical and Computational Technique......Page 411
Results and Discussion......Page 414
Literature Cited......Page 421
35 A Novel Phase of Organic Conductors: Conducting Polymer Solutions......Page 424
Gas Phase AsF3-AsF5 Synergism......Page 427
Solutions Of Doped PPS in AsF3 Liquid......Page 430
Literature Cited......Page 436
36 Poly-p-phenylene Selenide and Poly-p-phenylene Telluride Characterization and Assessment as Active Elements......Page 437
Synthesis and Composition......Page 438
Spectra and Structure......Page 440
Thermal Properties......Page 441
Exposure to Dopants and Electrical Properties......Page 445
Experimental Section......Page 446
Literature Cited......Page 447
Experimental......Page 450
Results and Discussion......Page 451
Acknowledgments......Page 460
Literature Cited......Page 461
38 The Influence of Microstructure on the Properties of Polyacetylene/Polybutadiene Blends......Page 462
Experimental......Page 463
Results and Discussion......Page 464
Conclusion......Page 470
Literature Cited......Page 471
39 Ethylene-Propylene-Diene Terpolymer/Polyacetylene and Styrene-Diene Triblock Copolymer/Polyacetylene Blends Characterization and Stability Studies......Page 472
Experimental......Page 473
Results and Discussions......Page 474
Literature Cited......Page 481
40 Conductive Hybrids Based on Polyacetylene: Copolymers and Blends......Page 482
Experimental......Page 484
Results and Discussion......Page 485
Literature Cited......Page 489
41 Electrically Conductive Polymer Composites of 7,7,8,8-Tetracyanoquinodimethane (TCNQ) Salt Dispersion Influence of Charge-Transfer Interaction and Film Morphology......Page 490
Experimental......Page 491
Results and Discussion......Page 492
Conclusions......Page 504
Literature Cited......Page 506
42 Synthesis and Properties of Conducting Films by Plasma Polymerization of Tetramethyltin......Page 507
Experimental......Page 508
Results and Discussion......Page 511
Summary and Conclusions......Page 524
Literature Cited......Page 526
43 Plasma Polymerized Organometallic Thin Films: Preparation and Properties......Page 528
Literature Review......Page 529
Experimental......Page 530
Results and Discussion......Page 532
Literature Cited......Page 546
Aqueous Electrochemistry of (CH)x......Page 548
Rechargeable Batteries Using (CH)x Film as Electrodes......Page 550
Literature Cited......Page 556
Author Index......Page 558
B......Page 559
C......Page 560
D......Page 562
E......Page 563
G......Page 564
I......Page 565
M......Page 566
N......Page 567
P......Page 568
R......Page 571
S......Page 572
T......Page 573
W......Page 575
Z......Page 576
