Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications.
Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Author(s): T. D. Mantei (auth.), P. F. Williams (eds.)
Series: NATO ASI Series 336
Edition: 1
Publisher: Springer Netherlands
Year: 1997
Language: English
Pages: 613
Tags: Electrical Engineering; Manufacturing, Machines, Tools; Optical and Electronic Materials; Atomic, Molecular, Optical and Plasma Physics
Front Matter....Pages i-x
Introduction to Plasma Etching....Pages 1-21
Plasma Chemistry, Basic Processes, and PECVD....Pages 23-59
The Role of Ions in Reactive Ion Etching with Low Density Plasmas....Pages 61-71
SiO 2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas....Pages 73-88
Introduction to Plasma Enhanced Chemical Vapor Deposition....Pages 89-108
Topography Evolution During Semiconductor Processing....Pages 109-124
Deposition of Amorphous Silicon....Pages 125-136
High Density Sources for Plasma Etching....Pages 137-156
Resonant Plasma Excitation by Electron Cyclotron Waves - Fundamentals and Applications....Pages 157-180
The Transition from Capacitive to Inductive to Wave Sustained Discharges....Pages 181-186
Physics of Surface-Wave Discharges....Pages 187-210
Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas....Pages 211-219
Plasma-Surface Interactions....Pages 221-242
Cl 2 Plasma — Si Surface Interactions in Plasma Etching: X-ray Photoelectron Spectroscopy After Etching, and Optical and Mass Spectrometry Methods During Etching ....Pages 243-275
Particle in Cell Monte Carlo Collision Codes(PIC-MCC); Methods and Applications to Plasma Processing....Pages 277-289
Fluid and Hybrid Models of Non Equilibrium Discharges....Pages 291-319
Optical Diagnostics of Processing Plasmas....Pages 321-338
Optical Diagnostics of Plasmas: A Tool for Process Control....Pages 339-358
Infrared Absorption Spectroscopy as a Diagnostic for Processing Plasmas....Pages 359-374
Ellipsometric Analysis of Plasma Deposited and Plasma Etched Materials....Pages 375-395
Mass Spectrometry of Reactive Plasmas....Pages 397-431
Deposition of Silicon Dioxide Films Using the Helicon Diffusion Reactor for Integrated Optics Applications....Pages 433-475
Remote Plasma Processing....Pages 477-490
Magnetized Surface-Wave Discharges for Submicrometer Pattern Transfer....Pages 491-513
Dusty Plasmas: Fundamental Aspects and Industrial Applications....Pages 515-527
Low Energy Plasma Beams for Semiconductor Technology....Pages 529-544
Process Control Concepts....Pages 545-564
Issues and Solutions for Applying Process Control to Semiconductor Manufacturing....Pages 565-583
Back Matter....Pages 585-613
