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Plasma Etching. An Introduction

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Author(s): Dennis M. Manos and Daniel L. Flamm (Eds.)
Series: Plasma: materials interactions
Publisher: Academic Press
Year: 1989

Language: English
Pages: 478
City: San Diego [u.a.]
Tags: Физика;Физика плазмы;

Content:
Plasma–Materials Interactions, Page ii
Front Matter, Page iii
Copyright, Page iv
Contributors, Page ix
Preface, Pages xi-xii, Dennis M. Manos, Daniel L. Flamm
1 - Plasma Etching Technology—An Overview, Pages 1-89, Daniel L. Flamma, G. Kenneth Herb
2 - Introduction to Plasma Chemistry, Pages 91-183, Daniel L. Flamm
3 - An Introduction to Plasma Physics for Materials Processing, Pages 185-258, Samuel A. Cohen
4 - Diagnostics of Plasmas for Materials Processing, Pages 259-337, D.M. Manos, H.F. Dylla
5 - Plasma Etch Equipment and Technology, Pages 339-389, Alan R. Reinberg
6 - Ion Beam Etching, Pages 391-423, James M.E. Harper
7 - Safety, Health, and Engineering Considerations for Plasma Processing, Pages 425-470, G.K. Herb
Index, Pages 471-476
Plasma–Materials Interactions, Page 477