Physics of Thin Films. Vol.14. Contemporary preparative techniques

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Academic Press, Boston, 1989, 260 c.
В книге представлены такие большие главы:
1) Реактивное распыление
2) Плазменное окисление
3) Катодное дуговое плазменное осаждение тонких пленок
4) Подготовка подложек для осаждения пленок с использованием методик тлеющего разряда

Author(s): Francombe M.H., Vossen J.L.

Language: English
Commentary: 415476
Tags: Физика;Физика плазмы