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Optical Lithography: Here is Why (SPIE Press Monograph Vol. PM190)

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This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. Topics include:- Exposure Systems- Image Formation- The Meter of Lithography- Components in Optical Lithography- Processing and Optimization- Immersion Lithography- Outlook for optical lithography

Author(s): Burn J. Lin
Series: SPIE Press Monograph PM190
Publisher: SPIE Publications
Year: 2009

Language: English
Pages: 493
Tags: Приборостроение;Полупроводниковые приборы;