Provides a broad introduction to nanophysics and nanotechnologies, and the importance of low-dimensional and surface physics is discussed indepth. Chapters in Volume 1 covers the large range of physical preparation techniques available for the production of nanomaterials and nanostructuring.
Author(s): David Schmool
Publisher: Apple Academic Press
Year: 2020
Language: English
Pages: 420
City: Palm Bay
Cover
Half Title
Title Page
Copyright Page
Dedication
About the Author
Contents
Preface
1. Introduction to Nanotechnologies
1.1 What is Nanoscience and Why Are We So Interested in It?
1.2 Modification of Physical Properties
1.3 Laws of Scaling in Physics
1.4 Methodologies: Bottom-Up/Top-Down
1.5 The Study of Nanomaterials
1.6 Problems
PART I. THE BASICS: SURFACE SCIENCE, THIN FILMS, AND SURFACE ANALYSIS
2. Vacuum Science and Technology
2.1 Introduction and Orders of Magnitude
2.2 Physical Principles of the Vacuum
2.2.1 The Kinetic Theory of Gases
2.2.2 The Maxwell-Boltzmann Velocity Distribution
2.2.3 Rate of Incidence
2.2.4 Mean Free Path
2.3 Pumping and Gas Flow
2.4 The Evacuation Process
2.5 Production of Vacua: Vacuum Pumps
2.5.1 Primary (Backing) Pumps
2.5.2 Booster Pumps
2.5.3 Secondary Pumps
2.6 Summary
2.7 Problems
3. The Physical Surface
3.1 Introduction
3.2 The Physical Surface: Perfect Surfaces and Real Surfaces
3.3 Surface Crystallography
3.3.1 Surface Reconstruction
3.3.2 The 2D Reciprocal Lattice
3.3.3 The Brillouin Zone for Crystalline Surfaces
3.4 Summary
3.5 Problems
4. Thin Films
4.1 Introduction
4.2 Deposition and Growth Modes
4.3 Nucleation and Coalescence
4.4 Island Shape
4.4.1 The Distribution of Island Sizes
4.4.2 Coarsening
4.4.3 Magic Islands
4.4.4 Vacancy Islands
4.5 Kinetic Effects in Homoepitaxial Growth
4.6 Strain Effects in Heteroepitaxy
4.7 Deposition Techniques
4.7.1 Molecular Beam Epitaxy (MBE)
4.7.2 Solid Phase Epitaxy (SPE)
4.7.3 Chemical Beam Epitaxy (CBE)
4.7.4 Pulsed Laser Deposition (PLD)
4.7.5 Sputter Deposition
4.8 Surfactant-Mediated Growth
4.9 Summary
4.10 Problems
5. Techniques for Surface and Nanostructure Analysis
5.1 Surface Diffraction Techniques
5.1.1 Introduction
5.1.2 Low-Energy Electron Diffraction (LEED)
5.1.3 Reflection High-Energy Election Diffraction
5.1.4 Grazing-Incidence X-Ray Diffraction
5.2 Electron Spectroscopies
5.2.1 Introduction
5.2.2 Electron Energy Analyzers
5.2.3 Auger Electron Spectroscopy
5.2.4 Electron Energy-Loss Spectroscopy
5.2.5 Photoelectron Spectroscopies
5.3 Microscopies at the Nanoscale
5.3.1 Introduction
5.3.2 Field Emission Microscopy
5.3.3 Field Ion Microscopy
5.3.4 Transmission Electron Microscopy
5.3.5 Scanning Electron Microscopy
5.3.6 Scanning Tunneling Microscopy
5.3.7 Atomic Force Microscopy
5.3.8 Magnetic Force Microscopy
5.3.9 Scanning Near-Field Optical Microscopy
5.4 Summary
5.5 Problems
PART II. NANOFABRICATION TECHNIQUES
6. Lithographic Technologies
6.1 Optical Lithography
6.1.1 Mask Aligning Lithography
6.1.2 Projection Lithography
6.1.3 Process of Optical Lithography
6.1.4 Resolution Enhancement
6.1.5 Alternative Methods of Optical Lithography
6.2 Electron Beam Lithography
6.2.1 Principles of Electron Optics
6.2.2 Electron Beam Lithography Systems
6.2.3 Electron Beam Resists and Processes
6.2.4 Ultimate Resolution of E-Beam Lithography
6.3 Focused Ion Beam Lithography
6.3.1 Liquid Metal Ion Sources
6.3.2 Focused Ion Beam Systems
6.3.3 Principle of Focused Ion Beam Processing
6.3.4 Ion Beam Assisted Deposition
6.3.5 Applications of FIB Technology
6.3.6 Focused Ion Beam Lithography
6.3.7 Focused Ion Beam Implantation
6.4 X-Ray Lithography
6.4.1 Fundamentals of X-Ray Lithography
6.4.2 X-Ray Lithography Apparatus
6.4.3 High-Resolution X-Ray Lithography
6.4.4 High Aspect Ratio XRL-LIGA Technology
6.5 Etching Techniques
6.5.1 Wet Chemical Etching
6.5.2 Anisotropic Wet Chemical Etching in Silicon
6.5.3 Isotropic Etching in Silicon
6.5.4 Isotropic Etching in Silicon Dioxide
6.5.5 Dry Etching: Reactive Ion Etching
6.5.6 Dry Etching: Deep Reactive Ion Etching
6.5.7 Dry Etching: Ion Sputter Etching
6.5.8 Dry Etching: Reactive Gas Etching
6.5.9 Dry Etching: Laser Micro-Machining
6.6 Summary
6.7 Problems
7. Replication Techniques
7.1 Nano-Imprint Lithography
7.2 Step and Flash Nano-Imprint Lithography
7.3 Soft Lithography
7.4 Micro-Molding of Plastics
7.5 Dip-Pen Nano-Lithography
7.6 Nano-Sphere and Nano-Stencil Lithography
7.7 Summary
8. Nanoparticle and Nanowire Fabrication
8.1 2D Nanoparticle Assemblies
8.2 3D Nanoparticle Assemblies: Clusters and Colloids
8.3 Ordered Assemblies of Nanoparticles
8.4 Template Assisted Nanowire Synthesis
8.5 The VLS Method of Nanowire Growth
8.6 Other Methods of Nanowire Synthesis
8.7 The Hierarchical Arrangement of Nanowires and Nanowire Superstructures
8.8 Summary
9. Other Fabrication Techniques and Technologies
9.1 Fullerenes
9.2 Carbon Nanotubes
9.3 Synthesis of Carbon Nanotubes
9.3.1 High Temperature Synthesis
9.3.2 Moderate Temperature Synthesis
9.3.3 Growth Mechanisms for CNTs
9.4 Self-Assembly
9.5 Summary
9.6 Problems
Index
