Nanofabrication: Nanolithography techniques and their applications

PRELIMS.pdf
Preface
Acknowledgements
Editor biography
José Maria De Teresa
List of contributors
CH001.pdf
Chapter 1 Introduction to nanolithography techniques and their applications
1.1 Key concepts in nanolithography
1.1.1 Top-down versus self-assembly and self-organization processes
1.1.2 Resolution, cost, throughput and complexity
1.2 Nanolithography techniques using resists
1.2.1 Optical lithography (OL)
1.2.2 Electron beam lithography (EBL)
1.2.3 Nanoimprint lithography (NIL)
1.3 Direct nanolithography techniques
1.3.1 Focused ion beam (FIB)
1.3.2 Focused electron/ion beam induced deposition (FEBID and FIBID)
1.3.3 Scanning probe lithography (SPL)
1.4 Other nanolithography techniques and hybrid approaches
1.4.1 Stencil lithography
1.4.2 Nanosphere/colloidal lithography
1.4.3 Hybrid approaches
1.5 Comparison of nanolithography techniques
1.6 Applications of nanolithography techniques
1.6.1 Classical applications
1.6.2 Interdisciplinary applications
1.6.3 Emergent and future applications
1.7 End-of-chapter summary
1.8 Students’ corner
Acknowledgements
References
CH002.pdf
Chapter 2 Optical lithography
2.1 Concept of optical lithography
2.2 Optical lithography using optical masks
2.2.1 Optical lithography exposure modes and their resolution
2.2.2 Photo-resists
2.2.3 Extreme ultraviolet (EUV) optical lithography
2.3 Maskless optical lithography
2.3.1 Direct laser lithography
2.3.2 Two-photon lithography
2.4 Directed self-assembly (DSA)
2.4.1 Principles of DSA of block copolymers
2.4.2 Strategies for alignment of block copolymers
2.4.3 Applications
2.5 End-of-chapter summary
2.6 Student’s corner
References
CH003.pdf
Chapter 3 Electron beam lithography and its use on 2D materials
3.1 Introduction
3.2 Fundamentals of EBL
3.2.1 Chamber and electron column
3.2.2 Basic and lift-off EBL processes
3.2.3 Resolution
3.2.4 Scan modes, writing field, DAC, stitching, beam stability
3.2.5 Resists
3.2.6 Cross-linking problem
3.3 Steps for a successful EBL process
3.3.1 Spin coating
3.3.2 EBL on a bare wafer (WA>WF)
3.3.3 EBL in a wafer with alignment markers (WA 3.3.4 Two different resists: polymethylmethacrylate (PMMA) versus higher resolution hydrogen silsesquioxane (HSQ)
3.4 ICP-RIE and E-beam evaporation
3.4.1 ICP-RIE
3.4.2 E-beam metal evaporation
3.5 EBL applied to 2D materials
3.5.1 Hall bars in graphene heterostructures
3.5.2 Quantum point contacts defined by cryo-etching
3.5.3 Dual-gated graphene FETs
3.5.4 Hall bars in other 2D materials
3.6 General applications and new developments in EBL technique
3.7 End-of-chapter summary
3.8 Student’s corner
Acknowledgements
References
CH004.pdf
Chapter 4 Focused electron beam induced deposition
4.1 Introduction
4.2 Principles of FEBID
4.2.1 Electron–matter interaction
4.2.2 Monte Carlo method towards FEBID simulations
4.2.3 Single precursor species model
4.2.4 General features of FEBID precursors, growth parameters and applications
4.3 FEBID precursors and deposited materials
4.3.1 Precursors and properties of as-grown materials
4.3.2 Improving properties
4.4 Applications
4.5 Additional FEBID strategies and novel developments
4.6 End-of-chapter summary
4.7 Student’s corner
Acknowledgements
References
CH005.pdf
Chapter 5 Focused ion beam induced processing
5.1 Introduction
5.2 The instrument
5.2.1 Historical development
5.2.2 Ion sources
5.2.3 Ion column
5.2.4 Gas injection system
5.2.5 Process chamber and electron/ion detectors
5.2.6 Additional modules
5.3 Basics of FIB processing
5.3.1 Ion–solid interactions
5.3.2 Operating the beam
5.4 Milling and materials modification
5.4.1 Milling
5.4.2 FIB irradiation for materials modification
5.5 Focused ion beam induced deposition
5.5.1 Fundamentals
5.5.2 Applications of FIBID
5.6 Other applications of focused ion beams
5.6.1 FIB-based imaging
5.6.2 FIB-based tomography
5.6.3 Secondary-ion mass spectrometry
5.6.4 Current developments and future challenges
5.7 End-of-chapter summary
5.8 Students’ corner
Acknowledgements
List of acronyms
References
CH006.pdf
Chapter 6 Scanning probe lithography
6.1 Introduction: from atomic-scale modifications to scanning probe lithography
6.2 Oxidation SPL
6.2.1 Key aspects of o-SPL
6.2.2 Nanolithography
6.2.3 Beyond oxidation processes
6.3 Thermal SPL
6.3.1 Key aspects of t-SPL
6.3.2 Nanolithography
6.4 Deposition SPL
6.4.1 Key aspects of deposition SPL
6.4.2 Nanolithography
6.5 Other SPL methods
6.6 End-of-chapter summary
6.7 Student’s corner
Acknowledgments
References
CH007.pdf
Chapter 7 Soft thermal nanoimprint and hybrid processes to produce complex structures
7.1 Fundamentals of nanoimprint processes
7.1.1 Introduction
7.1.2 Basic nanoimprint processes and variants
7.2 Soft thermal nanoimprint lithography (soft T-NIL)
7.2.1 Thermoplastic polymers for soft T-NIL
7.2.2 Molds for soft T-NIL
7.3 Complex structures by soft thermal nanoimprint and hybrid processes
7.3.1 Introduction
7.3.2 High-aspect ratio imprinting
7.3.3 Multilevel hierarchical complex nanoimprinting
7.4 End-of-chapter summary
7.5 Student’s corner
References
CH008.pdf
Chapter 8 Stencil lithography
8.1 Introduction
8.1.1 Brief history of stencil in micropatterning
8.1.2 Why is stencil lithography interesting?
8.1.3 Why is stencil lithography challenging?
8.2 Fabrication of stencil membranes
8.2.1 Membrane material
8.2.2 Fabrication steps
8.2.3 Membrane reinforcement
8.3 Challenges of stencil lithography
8.3.1 Blurring
8.3.2 Shadowing
8.3.3 Clogging
8.3.4 Cracking and bending
8.4 Design considerations
8.4.1 Process as collimated as possible
8.4.2 Thin but robust membranes
8.4.3 Durable material (both mechanically and chemically)
8.4.4 Surface treatment
8.4.5 Reducing gap
8.5 Alignment
8.6 Dynamic stencil
8.7 Applications
8.8 End of chapter summary
8.9 Student’s corner
Acknowledgements
References
CH009.pdf
Chapter 9 Ice lithography
9.1 Introduction and historical perspective
9.2 Fundamentals
9.2.1 Energetic electrons
9.2.2 Ices, condensed gases in vacuum
9.2.3 Electron–ice interactions
9.2.4 Summary
9.3 Lithography using electrons and ices
9.3.1 Ice lithography process
9.3.2 Ice lithography resist
9.3.3 Ice lithography instrument
9.4 Applications
9.4.1 Nanofabrication on 3D structures
9.4.2 Nanofabrication on fragile structures
9.4.3 Rapid prototyping
9.4.4 High-resolution patterning
9.5 Future research, opportunities and challenges
9.5.1 Fundamental science research
9.5.2 Icetronics research
9.5.3 Applications
9.6 End-of-chapter summary
9.7 Student’s corner
References
CH010.pdf
Chapter 10 Magnetic nanopatterning via thermal scanning probe lithography
10.1 Introduction
10.2 Thermally-assisted magnetic scanning probe lithography
10.2.1 Concept
10.2.2 Patterning magnetic domains, domain walls and solitons
10.2.3 Writing spin textures in synthetic antiferromagnets
10.2.4 Features and capabilities of tam-SPL
10.3 Nanopatterned spin textures for magnonics
10.3.1 Controlling the spin-wave excitation and propagation with magnetic domains
10.3.2 Nanoscale spin-wave circuits based on spin textures
10.3.3 Optically inspired nanomagnonics in synthetic antiferromagnets
10.4 End-of-chapter summary
10.5 Student’s corner
Acknowledgements
References
CH011.pdf
Chapter 11 Nanofabrication of three-dimensional magnetic structures
11.1 Introduction
11.1.1 3D magnetic nanostructures for the future
11.2 Overview of nanofabrication techniques for magnetism
11.3 Direct-write techniques for 3D nanofabrication of magnetic materials
11.4 Focused electron beam induced deposition
11.4.1 FEBID for magnetism
11.4.2 FEBID fundamentals
11.4.3 FEBID resolution
11.4.4 FEBID theory, modelling and practical recommendations
11.4.5 FEBID: 3D nanopatterning algorithms
11.4.6 FEBID and thin film deposition: hybrid approach for 3D nanopatterning
11.5 Two-photon lithography
11.5.1 Two-photon lithography for 3D nanomagnetism
11.5.2 Examples of scaffold lithography using two-photon lithography
11.6 Electrodeposition of 3D materials
11.6.1 Electrodeposition for 3D nanomagnetism
11.6.2 Electrodeposition of nanowires
11.6.3 Nanostructured multilayered nanowires
11.6.4 Electrodeposition of complex structures
11.7 End-of-chapter summary
11.8 Student’s corner
References
CH012.pdf
Chapter 12 FEBIP for functional nanolithography of 2D nanomaterials
12.1 Introduction
12.2 Atomic manipulation of 2D nanomaterials
12.2.1 Defect engineering of 2D nanomaterials
12.2.2 Directing matter: atomic forging with in situ imaging and material manipulations
12.3 Directed surface and interface modification of graphene-based nanomaterials using focused electron beam and precursor molecules
12.3.1 Graphene oxide
12.3.2 Other members of graphene-based nanomaterials
12.4 Focused electron beam induced etching (FEBIE) of 2D nanomaterials
12.5 Applications of the FEBIP techniques to 2D nanomaterial-based electronic devices
12.5.1 Nanoscale welding
12.5.2 Reconfigurable graphene doping
12.5.3 Tuning MoS2-based nanoelectronic devices
12.6 End-of-chapter summary
12.7 Student’s corner
Acknowledgements
References
APP1.pdf
Chapter
Chapter 1 Introduction to nanolithography techniques and their applications
Chapter 2 Optical lithography
Chapter 3 Electron beam lithography
Chapter 4 Focused electron beam induced deposition
Chapter 5 Focused ion beam induced processing
Chapter 6 Scanning probe lithography
Chapter 7 Soft thermal nanoimprint and hybrid processes to produce complex structures
Chapter 8 Stencil lithography
Chapter 9 Ice lithography
Chapter 10 Magnetic nanopatterning via thermal scanning probe lithography
Chapter 11 Nanofabrication of three-dimensional magnetic structures