Content: Fundamental limits of lithography / T.E. Everhart --
Practical and fundamental aspects of lithography / A.N. Broers --
A perspective on resist materials for fine-line lithography / M.J. Bowden --
Fundamental radiation chemistry : fundamental aspects of polymer degradation by high-energy radiation / D.J.T. Hill, J.H. O'Donnell, and P.J. Pomery --
Pulse radiolysis studies on the mechanism of the high sensitivity of chloromethylated polystyrene as an electron negative resist / Y. Tabata, S. Tagawa, and M. Washio --
Photochemistry of ketone polymers in the solid phase : a review / J.E. Guillet, S.-K.L. Li, and H.C. Ng --
Radiolysis of poly(isopropenyl t-butyl ketone) / S.A. Macdonald, H. Ito, C.G. Willson, J.W. Moore, H.M. Gharapetian, and J.E. Guillet --
Polymer-bonded electron-transfer sensitizers / S. Tazuke, R. Takasaki, Y. Iwaya, and Y. Suzuki --
Laser-induced polymerization / C. Decker --
Novel synthesis and photochemical reaction of the polymers with pendant photosensitive and photosensitizer groups / T. Nishikubo, T. Iizawa, and E. Takahashi --
A novel technique for determining radiation chemical yields of negative electron-beam resists / A. Novembre and T.N. Bowmer --
Anomalous topochemical photoreaction of olefin crystals / M. Hasegawa, K. Saigo, and T. Mori --
The photo-Fries rearrangement and its use in polymeric imaging systems / T.G. Tessier, J.M.J. Frechet, C.G. Willson, and H. Ito --
Soluble polysilane derivatives : interesting new radiation-sensitive polymers / R.D. Miller, D. Hofer, D.R. McKean, C.G. Willson, R. West, and P.T. Trefonas, III --
Preparation and resolution characteristics of a novel silicone-based negative resist / A. Tanaka, M. Morita, S. Imamura, T. Tamamura, and O. Kogure --
Positive-working electron-beam resists based on maleic anhydride copolymers / K.U. Pohl, F. Rodriguez, Y.M.N. Namaste, and S.K. Obendorf --
Functionally substituted Novolak resins : lithographic applications, radiation chemistry, and photooxidation / H. Hiraoka --
Synthesis, characterization and lithographic evaluation of chlorinated polymethylstyrene / R. Tarascon, M. Hartney, and M.J. Bowden --
Photochemistry of ketone polymers in the solid phase : thin film studies of vinyl ketone polymers / J.E. Guillet, S.-K.L. Li, S.A. Macdonald, and C.G. Willson --
Polymers of [alpha]-substituted benzyl methacrylates and aliphatic aldehydes as new types of electron-beam resists / K. Hatada, T. Kitayama, Y. Okamoto, H. Yuki, H. Aritome, S. Namba, K. Nate, T. Inoue, and H. Yokono --
Radiation chemistry of phenolic resin containing epoxy and azide compounds / H. Shiraishi, T. Ueno, O. Suga, and S. Nonogaki --
Organic direct optical recording media / L. Alexandru, M.A. Hopper, R.O. Loutfy, J.H. Sharp, P.S. Vincett, G.E. Johnson, and K.Y. Law --
Primary and secondary reactions in photoinitiated free-radical polymerization of organic coatings / A. Hult and B. Ranby --
Radiation stability of silicon elastomers / G.C. Corfield, D.T. Astill, and D.W. Clegg.
Author(s): L. F. Thompson, C. G. Willson, and J. M. J. Fréchet (Eds.)
Series: ACS Symposium Series 266
Publisher: American Chemical Society
Year: 1984
Language: English
Pages: 478
City: [Washington, D.C.]
Title Page......Page 1
Copyright......Page 2
ACS Symposium Series......Page 3
FOREWORD......Page 4
PdftkEmptyString......Page 0
PREFACE......Page 5
1 Fundamental Limits of Lithography......Page 7
Literature Cited......Page 11
Linewidth and Overlay......Page 12
UV Shadow Printing......Page 13
Resolution......Page 14
Scanning Mirror Systems......Page 15
Step and Repeat Camera......Page 16
X-Ray Lithography......Page 18
Electron Storage Ring......Page 20
Resolution of X-Ray Lithography......Page 21
Shaped Beam Versus Round Beam......Page 23
Round-beam Vectorscan Systems......Page 24
EL3 — Variable-Shaped Beam Vectorscan System......Page 25
Resolution for Electron Beam Exposure......Page 26
Resist Contrast......Page 27
Normalized Aperture Exposure......Page 30
Fabrication of Structure with Dimensions Below 10 nm......Page 32
Ion Beam Resist Exposure......Page 35
Literature Cited......Page 37
3 A Perspective on Resist Materials for Fine-Line Lithography......Page 40
Resist Requirements......Page 44
Fundamental Considerations......Page 49
Photoresists......Page 50
Electron Resists......Page 66
X-ray Resists......Page 84
Ion Beam Resists......Page 86
Inorganic Resists......Page 91
Multilevel Schemes......Page 97
Dry-Developable Resists......Page 104
New Mechanisms......Page 107
Literature Cited......Page 112
4 Fundamental Aspects of Polymer Degradation By High-Energy Radiation......Page 119
Experimental......Page 121
Results and Discussion......Page 126
Literature Cited......Page 142
Experimental......Page 144
Results and Discussions......Page 146
Literature Cited......Page 156
6 Photochemistry of Ketone Polymers in the Solid Phase: A Review......Page 157
Effect of Crystallinity......Page 161
The Effect of the Glass Transition Temperature......Page 163
The Photo-Fries Reaction......Page 166
Conclusions......Page 167
Literature Cited......Page 169
7 Radiolysis of Poly(isopropenyl t-butyl ketone)......Page 170
Results......Page 172
Literature Cited......Page 177
8 Polymer-Bonded Electron-Transfer Sensitizers......Page 178
Experimental......Page 179
Results and Discussion......Page 180
Conclusions......Page 194
Literature Cited......Page 196
9 Laser-Induced Polymerization......Page 197
Background......Page 198
Experimental......Page 200
Kinetics of the Laser-induced Photopolymerization......Page 202
Light Intensity Effect......Page 206
Discussion......Page 209
Literature Cited......Page 212
10 Novel Synthesis and Photochemical Reaction of the Polymers with Pendant Photosensitive and Photosensitizer Groups......Page 214
Experimental......Page 215
Results and Discussion......Page 217
Conclusions......Page 228
Literature Cited......Page 229
11 A Novel Technique for Determining Radiation Chemical Yields of Negative Electron-Beam Resists......Page 230
Experimental......Page 231
Results and Discussion......Page 232
Literature Cited......Page 239
Appendix......Page 241
12 Anomalous Topochemical Photoreaction of Olefin Crystals......Page 244
Discussion......Page 245
Literature Cited......Page 252
13 The Photo-Fries Rearrangement and Its Use in Polymeric Imaging Systems......Page 254
Preparation of the Polymers......Page 256
Photochemical Studies......Page 257
Imaging Experiments......Page 266
Experimental......Page 267
Acknowledgments......Page 275
Literature Cited......Page 276
14 Soluble Polysilane Derivatives: Interesting New Radiation-Sensitive Polymers......Page 278
Synthesis and Characterization......Page 279
Spectral Properties......Page 281
Photochemistry......Page 284
Sensitization......Page 289
Lithography......Page 292
Literature Cited......Page 294
15 Preparation and Resolution Characteristics of a Novel Silicone-Based Negative Resist......Page 296
Experimental......Page 297
Exposure Characteristics......Page 298
Post-irradiation Polymerization......Page 300
Dry Etching Durability......Page 302
Resolution of Two Layer Resist with SNR/AZ Resist......Page 304
Literature Cited......Page 307
Maleic Anhydride......Page 308
Characterizing Sensitivity......Page 309
Copolymer with Alpha-Methylstyrene......Page 311
Copolymer with Isopropenyl Acetate......Page 316
Copolymers with Olefins......Page 318
Copolymer with Methyl Methacrylate......Page 319
Literature Cited......Page 322
17 Functionally Substituted Novolak Resins: Lithographic Applications, Radiation Chemistry, and Photooxidation......Page 324
Cresol-Formaldehyde Novolak Resins......Page 325
Experimental......Page 329
Results and Discussion......Page 336
Literature Cited......Page 343
18 Synthesis, Characterization and Lithographic Evaluation of Chlorinated Polymethylstyrene......Page 346
Experimental......Page 347
Results and Discussion......Page 348
Literature Cited......Page 372
19 Photochemistry of Ketone Polymers in the Solid Phase: Thin Film Studies of Vinyl Ketone Polymers......Page 374
Photolysis of PS-tBVK......Page 378
Exposure to Synchrotron Radiation......Page 380
Literature Cited......Page 383
20 Polymers of α-Substituted Benzyl Methacrylates and Aliphatic Aldehydes as New Types of Electron-Beam Resists......Page 384
Experimental......Page 385
Results and Discussion......Page 387
Literature Cited......Page 405
21 Radiation Chemistry of Phenolic Resin Containing Epoxy and Azide Compounds......Page 407
Results and Discussion......Page 408
Summary......Page 415
Literature Cited......Page 417
22 Organic Direct Optical Recording Media......Page 419
Laser Induced Dye Amplification (LIDA)......Page 421
Dye in Polymer (DIP)......Page 427
Conclusion......Page 437
Literature Cited......Page 438
23 Primary and Secondary Reactions in Photoinitiated Free-Radical Polymerization of Organic Coatings......Page 440
Primary Reactions of Type 1 Photoinitiators......Page 441
Primary Reactions of Type 2 Photoinitiators......Page 442
Secondary Reactions of Type 1 Photoinitiators: Model Studies with Polystyrene......Page 444
Secondary Reactions of Type 2 Initiators: Model Studies with PMMA......Page 446
Photocuring in Air Using a Surface Active Photoinitiator......Page 450
Literature Cited......Page 453
24 Radiation Stability of Silicon Elastomers......Page 456
Results and Discussion......Page 457
Literature Cited......Page 463
AUTHOR INDEX......Page 464
A......Page 465
C......Page 466
D......Page 467
E......Page 468
I......Page 469
M......Page 470
O......Page 471
P......Page 472
R......Page 475
S......Page 476
X......Page 477
Z......Page 478
