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Ion Implantation Techniques: Lectures given at the Ion Implantation School in Connection with Fourth International Conference on Ion Implantation: Equipment and Techniques Berchtesgaden, Fed. Rep. of Germany, September 13–15, 1982

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Author(s): Hans Glawischnig (auth.), Dr. Heiner Ryssel, Dr. Hans Glawischnig (eds.)
Series: Springer Series in Electrophysics 10
Edition: 1
Publisher: Springer-Verlag Berlin Heidelberg
Year: 1982

Language: English
Pages: 374
Tags: Crystallography;Surfaces and Interfaces, Thin Films;Engineering, general

Front Matter....Pages I-XII
Front Matter....Pages 1-1
Ion Implantation System Concepts....Pages 3-21
Ion Sources....Pages 23-71
Faraday Cup Designs for Ion Implantation....Pages 73-103
Safety and Ion Implanters....Pages 105-120
Front Matter....Pages 121-121
The Stopping and Range of Ions in Solids....Pages 122-156
The Calculation of Ion Ranges in Solids with Analytic Solutions....Pages 157-176
Range Distributions....Pages 177-205
Front Matter....Pages 207-207
Electrical Measuring Techniques....Pages 209-234
Wafer Mapping Techniques for Characterization of Ion Implantation Processing....Pages 235-253
Non-Electrical Measuring Techniques....Pages 255-297
Annealing and Residual Damage....Pages 299-316
Front Matter....Pages 317-317
Evolution and Performance of the Nova NV-ID Predep™ Implanter....Pages 319-342
Ion Implantation Equipment from Veeco....Pages 343-350
The Series IIIA and IIIX Ion Implanters....Pages 351-358
Standard High-Voltage Power Supplies for Ion Implantation....Pages 359-360
The IONMICROPROBE A-DIDA 3000-30 for Dopant Depth Profiling and Impurity Bulk Analysis....Pages 361-366
Back Matter....Pages 367-372