Ion Beams in Nanoscience and Technology

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Energetic ion beam irradiation is the basis of a wide plethora of powerful research- and fabrication-techniques for materials characterisation and processing on a nanometre scale. Materials with tailored optical, magnetic and electrical properties can be fabricated by synthesis of nanocrystals by ion implanation, focused ion beams can be used to machine away and deposit material on a scale of nanometres and the scattering of energetic ions is a unique and quantitative tool for process development in high speed electronics and 3-D nanostructures with extreme aspect radios for tissue engineering and nano-fluidics lab-on-a-chip may be machined using proton beams. This book will benefit practitioners, researchers and graduate students working in the field of ion beams and application and more generally everyone concerned with the broad field of nanoscience and technology.

Author(s): Daniel J. White, Harry J. Whitlow (auth.), Ragnar Hellborg, Harry J. Whitlow, Yanwen Zhang (eds.)
Series: Particle Acceleration and Detection
Edition: 1
Publisher: Springer-Verlag Berlin Heidelberg
Year: 2010

Language: English
Pages: 457
Tags: Nanotechnology;Measurement Science and Instrumentation;Particle Acceleration and Detection, Beam Physics;Solid State Physics;Spectroscopy and Microscopy

Front Matter....Pages i-xx
Front Matter....Pages 1-1
Nanoscale Engineering in the Biosciences....Pages 3-20
High Speed Electronics....Pages 21-35
Surface Modification Using Reactive Landing of Mass-Selected Ions....Pages 37-65
Front Matter....Pages 67-67
Basics of Ion Scattering in Nanoscale Materials....Pages 69-86
Box 1: Stopping of Ions in Nanomaterials....Pages 87-93
Box 2: Sputtering....Pages 95-101
Box 3: Ion Ranges....Pages 103-105
Computer Simulation Methods for Defect Configurations and Nanoscale Structures....Pages 107-127
Characterising Nanoscale Crystal Perfection by Crystal Mapping....Pages 129-145
Box 4: Interatomic Potential....Pages 147-149
Front Matter....Pages 151-151
Medium Energy Ion Scattering for Near Surface Structure and Depth Profiling....Pages 153-167
Box 5: Surface Crystallography Terminology....Pages 169-170
Thin Film Characterisation Using MeV Ion Beams....Pages 171-183
Nanoscale Materials Defect Characterisation....Pages 185-204
Box 6: Nanoscale Defects....Pages 205-210
Box 7: Diagnostic Ion Beam Luminescence....Pages 211-217
Nanomaterials Science with Radioactive Ion Beams....Pages 219-235
Front Matter....Pages 237-237
Nanocluster and Nanovoid Formation by Ion Implantation....Pages 239-249
Plasma Etching and Integration with Nanoprocessing....Pages 251-263
Focused Ion Beam Machining and Deposition....Pages 265-290
Front Matter....Pages 237-237
Box 8: Sample Preparation for Transmission Electron Microscopy Using a Focused Ion Beam....Pages 291-292
Box 9: Integrated Circuit Chip Modification Using Focused Ion Beams....Pages 293-296
Proton Beam Writing: A New 3D Nanolithographic Technique....Pages 297-310
Box 10: Proton Beam Writing of Optical Structures....Pages 311-314
Box 11: Tissue Engineering and Bioscience Methods Using Proton Beam Writing....Pages 315-317
Box 12: Stamps for Nanoimprint Lithography....Pages 319-322
Box 13: Silicon Micro/Nano-Fabrication Using Proton Beam Writing and Electrochemical Etching....Pages 323-328
Nanoscale Materials Modification for Device Applications....Pages 329-355
Luminescence, Ion Implantation, and Nanoparticles....Pages 357-367
Micro- and Nanoengineering with Ion Tracks....Pages 369-387
Front Matter....Pages 389-389
Ion Accelerators for Nanoscience....Pages 391-411
Focusing keV and MeV Ion Beams....Pages 413-420
Ion Spectrometers and Detectors....Pages 421-429
Electronics for Application of Ion Beams in Nanoscience....Pages 431-439
Back Matter....Pages 1-5