Content: Unit processes in the manufacture of integrated circuits / Pieter Stroeve --
Conservation laws for mass, momentum, and energy : application to semiconductor devices and technology / Bill Baerg --
Silicon oxidation : a process step for the manufacture of integrated circuits / Eugene A. Irene --
Convective diffusion in zone refining of low Prandtl number liquid metals and semiconductors / William N. Gill, Nicholas D. Kazarinoff, and John D. Verhoeven --
Research opportunities in resist technology / David S. Soong --
Physical and chemical modifications of photoresists / Peter C. Sukanek --
Effects of developer concentration on linewidth control in positive photoresists / Tom Batchelder --
The advantage of molecular-beam epitaxy for device applications / A.Y. Cho --
Chemical and physical processing of ion-implanted integrated circuits / Joseph C. Plunkett --
Plasma-assisted processing : the etching of polysilicon in a diatomic chlorine discharge / Herbert H. Sawin, Albert D. Richards, and Brian E. Thompson --
Applications of oxides and nitrides of germanium for semiconductor devices / O.J. Gregory and E.E. Crisman --
Vapor-phase epitaxy of Group III-V compound optoelectronic devices / G.H. Olsen --
Advanced device isolation for very large scale integration / H.B. Pogge --
Solid-liquid equilibrium in ternary Group III-V semiconductor materials / T.L. Aselage, K.M. Chang, and T.J. Anderson : preparation of device-quality strained-layer superlattices / R.M. Biefeld --
Wafer design and characterization for integrated-circuit processes / R. Schindler, D. Huber, and J. Reffle.
Author(s): Pieter Stroeve (Eds.)
Series: ACS Symposium Series 290
Publisher: American Chemical Society
Year: 1985
Language: English
Pages: 355
City: Washington, DC