This book introduces contamination control in a comprehensive manner. It covers the basics for the beginner, and delves in depth into the more critical issues of process engineering and circuit manufacturing for the more advanced reader. The reader will begin to see how the puzzle of contamination control comes together and to focus on the fundamentals required for excellence in modern semiconductor manufacturing. What makes the area of contamination control unique is its ubiquitous nature, across all facets of semiconductor manufacturing. Clean room technology, well recognized as a fundamental requirement in modern day circuit manufacturing, barely scratches the surface in total contamination control. This handbook defines and describes most of the major categories in current contamination control technology.
Author(s): Donald L. Tolliver
Year: 1989
Language: English
Pages: 509
MATERIALS SCIENCE AND PROCESS TECHNOLOGY SERIES......Page 3
HANDBOOK OF CONTAMINATION CONTROL IN MICROELECTRONICS......Page 4
Preface......Page 6
Contributors......Page 10
Contents......Page 12
1 Aerosol Filtration Technology......Page 24
2 Instrumentation for Aerosol Measurement......Page 91
3 Clean Room Garments and Fabrics......Page 133
4 Guidelines for Clean Room Management and Discipline......Page 159
5 Electrostatics in Clean Rooms......Page 176
6 Ultra High Purity Water-New Frontiers......Page 208
7 Deionized (01) Water Filtration Technology......Page 233
8 Monitoring Systems for Semiconductor Fluids......Page 280
9 Particles in Ultrapure Process Gases......Page 324
10 Contamination Control and Concerns in VLSI Lithography......Page 371
11 Contamination Control in Microelectronic Chemicals......Page 393
12 Surface Particle Detection Technology......Page 406
13 Particle Contamination by Process Equipment......Page 433
14 Wafer Automation and Transfer Systems......Page 468
Glossary......Page 501
Index......Page 509
