Glow discharge processes. Sputtering and plasma etching

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Wiley, New York, 1980, 406 c.
Книга содержит следующие разделы:
Газы
Процессы столкновений в газовой фазе
Плазма
Тлеющие разряды постоянного тока
ВЧ разряды
Распыление
Плазменное травление

Author(s): Chapman B.,

Language: English
Commentary: 423086
Tags: Физика;Физика плазмы