This series, established in 1965, is concerned with recent developments in the general area of atomic, molecular, and optical physics. The field is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered also include related applied areas, such as atmospheric science, astrophysics, surface physics, and laser physics.Articles are written by distinguished experts who are active in their research fields. The articles contain both relevant review material as well as detailed descriptions of important recent developments.
Author(s): Benjamin Bederson and Herbert Walther (Eds.)
Series: Advances In Atomic, Molecular, and Optical Physics 43
Publisher: Elsevier, Academic Press
Year: 2000
Language: English
Pages: ii-x, 1-414
Tags: Физика;Периодика по физике;Advances in atomic, molecular, and optical physics;
Content:
Editors
Page ii
Edited by
Page iii
Copyright page
Page iv
Contributors
Pages ix-x
Plasma Processing of Materials and Atomic, Molecular, and Optical Physics. An Introduction Original Research Article
Pages 1-17
Hiroshi Tanaka, Mitio Inokuti
The Boltzmann Equation and Transport Coefficients of Electrons in Weakly Ionized Plasmas Original Research Article
Pages 19-77
R. Winkler
Electron Collision Data for Plasma Chemistry Modeling Original Research Article
Pages 79-110
W.L. Morgan
Electron—Molecule Collisions in Low-Temperature Plasmas: The Role of Theory Original Research Article
Pages 111-145
Carl Winstead, Vincent Mckoy
Electron Impact Ionization of Organic Silicon Compounds Original Research Article
Pages 147-185
Ralf Basner, Martin Schmidt, Kurt Becker, Hans Deutsch
Kinetic Energy Dependence of Ion–Molecule Reactions Related to Plasma Chemistry Original Research Article
Pages 187-229
P.B. Armentrout
Physicochemical Aspects of Atomic and Molecular Processes in Reactive Plasmas Original Research Article
Pages 231-241
Yoshihiko Hatano
Ion—Molecule Reactions Original Research Article
Pages 243-294
Werner Lindinger, Armin Hansel, Zdenek Herman
Uses of High-Sensitivity White-Light Absorption Spectroscopy In Chemical Vapor Deposition and Plasma Processing Original Research Article
Pages 295-339
L.W. Anderson, A.N. Goyette, J.E. Lawler
Fundamental Processes of Plasma—Surface Interactions Original Research Article
Pages 341-371
Rainer Hippler
Recent Applications of Gaseous Discharges: Dusty Plasmas and Upward-Directed Lightning Original Research Article
Pages 373-390,390a,391-398
Ara Chutjian
Opportunities and Challenges for Atomic, Molecular, and Optical Physics in Plasma Chemistry Original Research Article
Pages 399-406
Kurt Becker, Hans Deutsch, Mitio Inokuti
Index
Pages 407-414
