Epitaxy of Semiconductors: Introduction to Physical Principles

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Introduction to Epitaxy provides the essential information for a comprehensive upper-level graduate course treating the crystalline growth of semiconductor heterostructures. Heteroepitaxy represents the basis of advanced electronic and optoelectronic devices today and is considered one of the top fields in materials research. The book covers the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and the description of the major growth techniques metalorganic vapor phase epitaxy, molecular beam epitaxy and liquid phase epitaxy. Cubic semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures and processes during nucleation and growth are treated in detail. The Introduction to Epitaxy requires only little knowledge on solid-state physics. Students of natural sciences, materials science and electrical engineering as well as their lecturers benefit from elementary introductions to theory and practice of epitaxial growth, supported by pertinent references and over 200 detailed illustrations.

Author(s): Udo W. Pohl (auth.)
Series: Graduate Texts in Physics
Edition: 1
Publisher: Springer-Verlag Berlin Heidelberg
Year: 2013

Language: English
Pages: 326
Tags: Semiconductors;Optical and Electronic Materials;Physical Chemistry;Applied and Technical Physics;Crystallography

Front Matter....Pages I-XIV
Introduction....Pages 1-9
Structural Properties of Heterostructures....Pages 11-77
Electronic Properties of Heterostructures....Pages 79-129
Thermodynamics of Epitaxial Layer-Growth....Pages 131-170
Atomistic Aspects of Epitaxial Layer-Growth....Pages 171-224
Doping, Diffusion, and Contacts....Pages 225-273
Methods of Epitaxy....Pages 275-313
Back Matter....Pages 315-325