InTAvE, 2015. – 287 p. – ISBN: 9535122134 9789535122135This book collects new developments about electroplating and its use in nanotechnology.
The electroplating was widely used to electrodeposit the nanostructures because of its relatively low deposition temperature, low cost and controlling the thickness of the coatings. With advances in electronics and microprocessor, the amount and form of the electrodeposition current applied can be controlled.
The pulse electrodeposition has the interesting advantages such as higher current density application, higher efficiency and more variable parameters compared to direct current density.
Contents
Electrodeposition of Nanostructure Materials
Electrodeposition of WO3 Nanoparticles for Sensing Applications
Electrodeposition of Ferromagnetic Nanostructures
Aluminum Anodic Oxide AAO as a Template for Formation of Metal Nanostructures
Pulse Electroplating of Ultrafine Grained Tin Coating
Nucleation Behaviors of Nd and Dy in TFSA-Based Ionic Liquids
Electrodeposition of Thin Films for Low-cost Solar Cells
A Process for Preparing High Graphene Sheet Content Carbon Materials from Biochar Materials
Nanoscale Cu Wiring by Electrodeposition in Supercritical Carbon Dioxide Emulsified Electrolyte
Mechanical Property Evaluation of Electrodeposited Nanocrystalline Metals by Micro-testing
One-Step Electrodeposition of CZTS for Solar Cell Absorber Layer
The Coupled Magnetic Field Effects on the Microstructure Evolution and Magnetic Properties of As-Deposited and Post- Annealed Nano-Scaled Co-Based Films
