Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology.Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.
Author(s): Uzodinma Okoroanyanwu
Series: SPIE Press Monograph'', PM192
Edition: 1
Publisher: SPIE Press
Year: 2011
Language: English
Commentary: Missing pages: 1 and 179
Pages: 878
Tags: Приборостроение;Полупроводниковые приборы;
Contents......Page 8
Preface......Page 22
Acronyms and Abbreviations......Page 26
Introduction to Lithography......Page 31
Invention of Lithography and Photolithography......Page 37
Optical and Chemical Origins of Lithography......Page 57
Evolution of Lithography......Page 164
Lithographic Chemicals......Page 205
Negative Resists......Page 219
Positive Resists......Page 308
General Considerations on the Radiation and Photochemistry of Resists......Page 418
Antire.ection Coatings and Re.ectivity Control......Page 442
Stone, Plate, and Offset Lithography......Page 472
The Semiconductor Lithographic Process......Page 483
Lithographic Modeling......Page 570
Optical Lithography......Page 623
X-Ray and Extreme Ultraviolet Lithographies......Page 720
Charged Particle Lithography......Page 757
Lithography in Integrated Circuit Device Fabrication......Page 783
Advanced Resist Processing and Resist Resolution Limit Issues......Page 807
Afterword......Page 851