Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique).
This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Language: English
Pages: 456
Tags: Специальные дисциплины;Наноматериалы и нанотехнологии;Технологии получения наноматериалов и наноструктур;
Content:
Chapter 1 Theoretical Modeling of ALD Processes (pages 1–21): Charles B. Musgrave
Chapter 2 Step Coverage in ALD (pages 23–40): Sovan Kumar Panda and Hyunjung Shin
Chapter 3 Precursors for ALD Processes (pages 41–59): Matti Putkonen
Chapter 4 Sol–Gel Chemistry and Atomic Layer Deposition (pages 61–82): Guylhaine Clavel, Catherine Marichy and Prof. Dr. Nicola Pinna
Chapter 5 Molecular Layer Deposition of Hybrid Organic–Inorganic Films (pages 83–107): Steven M. George, Byunghoon Yoon, Robert A. Hall, Aziz I. Abdulagatov, Zachary M. Gibbs, Younghee Lee, Dragos Seghete and Byoung H. Lee
Chapter 6 Low?Temperature Atomic Layer Deposition (pages 109–130): Jens Meyer and Thomas Riedl
Chapter 7 Plasma Atomic Layer Deposition (pages 131–157): Erwin Kessels, Harald Profijt, Stephen Potts and Richard van de Sanden
Chapter 8 Atomic Layer Deposition for Microelectronic Applications (pages 159–192): Cheol Seong Hwang
Chapter 9 Nanopatterning by Area?Selective Atomic Layer Deposition (pages 193–225): Han?Bo?Ram Lee and Stacey F. Bent
Chapter 10 Coatings on High Aspect Ratio Structures (pages 227–249): Jeffrey W. Elam
Chapter 11 Coatings of Nanoparticles and Nanowires (pages 251–270): Hong Jin Fan and Kornelius Nielsch
Chapter 12 Atomic Layer Deposition on Soft Materials (pages 271–300): Gregory N. Parsons
Chapter 13 Application of ALD to Biomaterials and Biocompatible Coatings (pages 301–325): Dr. Mato Knez
Chapter 14 Coating of Carbon Nanotubes (pages 327–343): Catherine Marichy, Andrea Pucci, Marc?Georg Willinger and Nicola Pinna
Chapter 15 Inverse Opal Photonics (pages 345–376): Davy P. Gaillot and Christopher J. Summers
Chapter 16 Nanolaminates (pages 377–399): Adriana V. Szeghalmi and Mato Knez
Chapter 17 Challenges in Atomic Layer Deposition (pages 401–421): Markku Leskela
