World Scientific, 1994. 147 pp.Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics - ferromagnetic films, diffusion in thin films and mechanical properties of thin films - are discussed.
Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well.Thin Film Deposition Methods
Theories of Nucleation and Film Growth
Control and Measurement of Film Thickness
Electrical Conduction in Thin Films
Dielectric Properties of Thin Insulator Films
Superconducting Films
Semiconducting Films
Thin Ferromagnetic Films
Diffusion in Thin Films
Mechanical Properties of Thin Films
References
Index
