This volume documents the proceedings of the 7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Newark, NJ, June 19-21, 2000. The study of particles on surfaces is extremely important in a host of diverse technological areas, ranging from microelectronics to optics to biomedical. This volume contains a total of 28 papers, which were all properly peer reviewed, revised and edited before inclusion. Therefore, this book is not merely a collection of unreviewed manuscripts, but rather represents information which has passed peer scrutiny. Furthermore, the authors were asked to update their manuscripts, so the information contained in this book should be current and fresh. This volume is divided into two parts: 1) Particle Analysis and General Cleaning-Related Topics; and 2) Particle Adhesion and Removal. The topics covered include: surface analysis techniques for particle identification; cleaning, rinsing and drying issues in post-CMP cleaning; fundamental forces involved in particle adhesion; factors affecting adhesion of small (nanosize) particles; factors important in particle detachment; particle adhesion measurement by AFM; various (wet and dry) techniques for particle removal, e.g., laser, ultrasonic, megasonic, use of surfactants; toner particles and pharmaceutical particles. This volume offers a wealth of information on the tremendously technologically important field of particles on surfaces and should provide a consolidated source of current R&D activity in this arena. Therefore, it will be of value and use to anyone interested in the topic of particles on surfaces.
Author(s): K. L. Mittal
Publisher: CRC Press
Year: 2021
Language: English
Pages: 461
City: Boca Raton
Cover
Half Title
Title Page
Copyright Page
Table of Contents
Preface
Part 1: Particle Analysis and General Cleaning-Related Topics
Applying Surface Analysis Techniques for Particle Identification
Total Reflection and Grazing Emission X-Ray Fluorescence Spectrometry: Assessment of the Size of Contaminant Particles on Silicon Wafer Surfaces
Development of a Particle Deposition Meter
Reduction of Cleaning and Verification Times for an Aqueous Based Process by On-Line Monitoring
Implementation of the IMEC-Cleaning in Advanced CMOS Manufacturing
Cleaning, Rinsing and Drying Issues in Post-Cu CMP Cleaning: A Case Study
Aging Effects in Test Silicon Wafers Prepared for Wafer Cleaning Process Evaluation
Part 2: Particle Adhesion and Removal
Adhesion of Small Particles and Innovative Methods for Their Removal
Effects of Surface Roughness on Van Der Waals and Electrostatic Contributions to Particle-Particle Interactions and Particle Adhesion
Effect of Surface Hydrophobicity on the Detachment of Particles from Surfaces
Adhesion and Removal of Particles from Charged Surfaces Under a Humidity-Controlled Air Stream
Adhesion Measurements by AFM and Surface Energy Characteristics by IGC of Xerographic Toner Particles Under Different Mechanical and Environmental Conditions
Measurements of Adhesion Forces in Pharmaceutical Powder-Polymer Systems by Atomic Force Microscopy
Direct Adhesion Measurements Between Pharmaceutical Materials
Laser Assisted Particle Removal
Laser Removal of Particles from Solid Surfaces
Laser Assisted Particle Removal from Silicon Wafers
Laser Cleaning of Silicon Membrane Stencil Masks
Transient Laser-Based Surface Acceleration Simulations for Particle Removal
Particle Removal from Semiconductor Substrates Using the PLASMAX Technology
Particle Removal with Ultrasonics and Megasonics
Influence of Temperature and Dissolved Air on Megasonic Particle Removal
A Study of Particle Removal Based on Monte Carlo Simulation of Ion Interactions
Removal of Fibrin Coated Particles from Surfaces
Enhancement of Particle Removal and Modification of Interfacial Phenomena Using Surfactants
The Enhancement of Particle Removal by Adding Valtron SP2200 Surfactant into SC1 Solution
Optimization of Particle Removal Performance of dHF-Based Cleaning Recipes
Spray Cleaning with Hydrofluorocarbon Solutions
