This book on the Laser Crystallization of Silicon reviews the latest experimental and theoretical studies in the field. It has been written by recognised global authorities and covers the most recent phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon. Reflecting the truly interdisciplinary nature of the field that the series covers, this volume will continue to be of great interest to physicists, chemists, materials scientists and device engineers in modern industry. Valuable applications for industry, particularly in the fabrication of thin-film electronicsEach chapter has been peer reviewedAn important and timely contribution to the semiconductor literature
Author(s): Prof. H. Nickel (Eds.)
Series: Semiconductors and Semimetals 75
Edition: 1
Publisher: Elsevier, Academic Press
Year: 2003
Language: English
Pages: 1-201
Content:
Contents
Pages v-vii
List of Contributors
Page ix
Preface
Page xi
Chapter 1 Introduction to Laser Crystallization of Silicon Review Article
Pages 1-10
Norbert H Nickel
Chapter 2 Heat Transfer and Phase Transformations in Laser Melting and Recrystallization of Amorphous Thin Si Films Review Article
Pages 11-41
Costas P. Grigoropoulos, Seung-Jae Moon, Ming-Hong Lee
Chapter 3 Modeling Laser-Induced Phase-Change Processes: Theory and Computation Review Article
Pages 43-78
Robert Černý, Petr Přikryl
Chapter 4 Laser Interference Crystallization of Amorphous Films Review Article
Pages 79-118
Paulo V Santos
Chapter5 Structural and Electronic Properties of Laser-Crystallized Poly-Si Review Article
Pages 119-172
Philipp Lengsfeld, Norbert H. Nickel
Subject Index
Pages 173-177
Contents of Volume
Pages 179-201
